发明名称 SONIC AND CHEMICAL WAFER PROCESSOR
摘要 A workpiece processor has a process chamber for holding a liquid. A sonic element, such as a megasonic transducer, is positioned to provide sonic energy into the liquid. A workpiece holder is moveable from a first position, wherein a workpiece is held immersed in the liquid, for sonic processing, to a second position where the workpiece is generally aligned with spray nozzles. Process liquids and gases may be sprayed or otherwise provided onto the workpiece, optionally while the workpiece is rotating within the process chamber. A process chamber gas or vapor exhaust assembly prevents escape of process gases or vapors from the processor. The processor can provide both sonic processing, as well as liquid and/or gas chemical processing.
申请公布号 US2008029123(A1) 申请公布日期 2008.02.07
申请号 US20060461938 申请日期 2006.08.02
申请人 AEGERTER BRIAN;ZIMMERMAN NOLAN L;GENTRY CHRIS LEE;HANSON KYLE M 发明人 AEGERTER BRIAN;ZIMMERMAN NOLAN L.;GENTRY CHRIS LEE;HANSON KYLE M.
分类号 B08B3/12;B08B3/00;B08B7/00 主分类号 B08B3/12
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