| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that can more uniformly and efficiently process the entire surface of a substrate. SOLUTION: The substrate processing apparatus includes a fixed frame, a process chamber, a feed unit and a supplying unit. The fixed frame supports an end of a substrate. The process chamber houses the fixed frame to which a substrate is attached. The feed unit is located in the process chamber and supports an end portion of the fixed frame to transport the fixed frame into the process chamber. A pair of supplying units is disposed opposing at a predetermined distance from the respective faces of the substrate attached to the fixed frame transported by the feed unit, and simultaneously supplies a fluid to the faces of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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