发明名称 METHODS OF FABRICATION OF WAFER-LEVEL VACUUM PACKAGED DEVICES
摘要 An hermetic, gas filled or vacuum package device and method of making a vacuum package device. The device includes a device layer having one or more Micro Electro-Mechanical Systems (MEMS) devices. The device layer includes one or more electrical leads coupled to the one or more MEMS devices. The device also includes a first wafer having one or more silicon pins, wherein a first surface of the first wafer is bonded to a first surface of the device layer in such a manner that the one or more silicon pins are in electrical communication with the electrical leads. A second wafer, which may also have one or more silicon pins, is bonded to a second surface of the device layer. The first and second wafers are formed of borosilicate glass and the device layer is formed of silicon.
申请公布号 US2008029863(A1) 申请公布日期 2008.02.07
申请号 US20060462767 申请日期 2006.08.07
申请人 HONEYWELL INTERNATIONAL INC. 发明人 ESKRIDGE MARK H.;JAFRI IJAZ H.
分类号 H01L23/02 主分类号 H01L23/02
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