PHOTOSENSITIVE LITHOGRAPHIC PLATE MATERIAL

摘要

A photosensitive lithographic plate material which comprises a substrate and, formed thereon, a photosensitive layer comprising (A) a polymerization initiator, (B) a polymerizable compound having an ethylenic double bond, (C) a sensitizing dye, and (D) a polymeric binder, characterized in that the photosensitive layer contains a compound represented by the following general formula (1) as the sensitizing dye (C) and a biimidazole compound as the polymerization initiator (A). It is suitable for exposure to a laser light having a wavelength of 350-450 nm. It has high sensitivity and excellent storability.