发明名称 POROUS NICKEL FILM FORMING METHOD, RELATING ARTICLE, AND COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a porous nickel film forming method 10. <P>SOLUTION: The method 10 is a step 12 melting and atomizing two consumable electrode wires containing selected components to form a melted atomized material, and depositing a film on a substrate by forming film deposition on the substrate in a wire electric arc spraying device, and the step comprises a step containing nickel and sacrificial metal as the selected components; and a step decomposing 14 at least a part of the sacrificial metal from the film deposition by applying a positive potential to an alkali electrolyte and obtaining a porous nickel film. An electrolytic cell 40 having an electrode containing the porous nickel film is provided. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007324120(A) 申请公布日期 2007.12.13
申请号 JP20070096077 申请日期 2007.04.02
申请人 GENERAL ELECTRIC CO <GE> 发明人 ROSENZWEIG LARRY STEVEN;SOLOVEICHIK GRIGORII LEV;ZAPPI GUILLERMO DANIEL
分类号 H01M4/88;B01J23/80;B01J25/02;B01J37/02;C23C4/08;C25B11/03;C25F3/02;H01M4/90 主分类号 H01M4/88
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