| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that reduces an amount of electrostatic charges on a substrate to be processed, the charges generating in steps of mounting, adhering and dismounting the objective substrate having a photosensitive layer or the like onto and from a stage. <P>SOLUTION: The exposure device 100 comprises a light source unit 10 to emit exposure light, a stage 20 that holds a substrate 41 to be processed and can move and control the substrate in x, y, z and θ directions, and a control means 30 that controls the on-off state of the light source unit and movement of the stage, wherein the surface roughness of the stage 20 is controlled to 1 to 100 μm. Further, the surface of the stage 20 is subjected to a surface treatment by blasting or chemical etching as a means to obtain the 1 to 100 μm surface roughness of the stage 20. <P>COPYRIGHT: (C)2008,JPO&INPIT |
