| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method that can provide an extremely accurate simulation model. <P>SOLUTION: The method comprises steps of obtaining a CD value of a photoresist pattern actually formed based on a test pattern, obtaining information regarding the form of the photoresist pattern, determining the light intensity distribution of an optical image from simulation based on the test pattern, determining an experimental threshold defined by the CD value on the light intensity distribution corresponding to the CD value of the photoresist pattern, determining a feature amount of an optical image based on the light intensity distribution of the optical image, determining a first correlation between the information on the form of the photoresist pattern and the feature amount of the optical image, determining a second correlation between the information on the form of the photoresist pattern and the feature amount of the optical image, and determining a third correlation between the feature amount of the optical image and the experimental threshold using the first and second correlation. <P>COPYRIGHT: (C)2008,JPO&INPIT |
