| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid state photographing device for improving the smear characteristic and photo-sensitivity characteristic, and to provide its manufacturing method. SOLUTION: The solid state photographing device is provided with: a semiconductor substrate 11; two or more photoelectric conversion devices 13 arranged in the two-dimensional shape on the semiconductor substrate 11; a first transfer electrode film 15 and a second transfer electrode film 15A for transmitting a signal charge produced at the photoelectric conversion device 13; a carbon-based black filter layer 21 arranged above the second transfer electrode film 15A at a portion, where the second transfer electrode 15A of single layer is formed; and a pigment-based black filter layer 20 arranged above the first transfer electrode film 15 and the second transfer electrode film 15A at a portion, where the first transfer electrode film 15 and the second transfer electrode film 15A are laminated. COPYRIGHT: (C)2008,JPO&INPIT
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