| 摘要 |
<p>A photoacid generator is provided to produce a chemically amplified resist composition that has good control over pattern profile shape or thermal flow even when thin film is formed. A photoacid generator for a chemically amplified resist composition has a structure represented by the following formula 1, wherein Rs are identical to or different from each other and represent a hydrogen atom, a fluorine atom, a chlorine atom, a nitro group, or a straight, branched, or cyclic substituted or unsubstituted alkyl group or alkoxy group having 1-12 carbon atoms, n is 0 or 1, m is 1 or 2, r is an integer of 0-4, and r' is an integer of 0-5.</p> |
