发明名称 |
Plasma etching chamber parts made with EDM |
摘要 |
A method is disclosed for manufacturing chamber parts for plasma etching chambers involving electronic discharge machining (EDM) methods that allows silicon and other ceramic materials to be formed and drilled. Key factors disclosed relate to the clamping of such materials for the EDM machining to avoid the electrical current inhibiting influence of oxide coatings that these materials can form.
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申请公布号 |
US2007284339(A1) |
申请公布日期 |
2007.12.13 |
申请号 |
US20060449884 |
申请日期 |
2006.06.09 |
申请人 |
MOORE DAVID O;SEALS WILLIAM S;SPENCER SHANNON;DIERCKS GEORGE;POOVEY GARY |
发明人 |
MOORE DAVID O.;SEALS WILLIAM S.;SPENCER SHANNON;DIERCKS GEORGE;POOVEY GARY |
分类号 |
B23H1/00 |
主分类号 |
B23H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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