发明名称 Plasma etching chamber parts made with EDM
摘要 A method is disclosed for manufacturing chamber parts for plasma etching chambers involving electronic discharge machining (EDM) methods that allows silicon and other ceramic materials to be formed and drilled. Key factors disclosed relate to the clamping of such materials for the EDM machining to avoid the electrical current inhibiting influence of oxide coatings that these materials can form.
申请公布号 US2007284339(A1) 申请公布日期 2007.12.13
申请号 US20060449884 申请日期 2006.06.09
申请人 MOORE DAVID O;SEALS WILLIAM S;SPENCER SHANNON;DIERCKS GEORGE;POOVEY GARY 发明人 MOORE DAVID O.;SEALS WILLIAM S.;SPENCER SHANNON;DIERCKS GEORGE;POOVEY GARY
分类号 B23H1/00 主分类号 B23H1/00
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