| 摘要 |
A sensing mechanism for crystal orientation indication mark of semiconductor wafer is provided. The semiconductor wafer includes: a device region formed on a surface of the semiconductor wafer, plural devices are formed or are to be formed on the surface; a circular peripheral extra region formed around the device region; a chamfered portion formed at a peripheral edge portion of the peripheral extra region; a flat surface as a mark indicating a crystal orientation of the semiconductor wafer. The mark is positioned within a region of the chamfered portion and is perpendicular to a surface direction of the semiconductor wafer. The sensing mechanism includes: an optical sensor having an optical axis parallel to the surface direction of the semiconductor wafer; and a rotatable holding table for holding the semiconductor wafer. The flat surface is sensed by the sensing mechanism.
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