摘要 |
The present invention is directed to an improved copper plating bath for depositing a copper layer onto a printing cylinder, the copper plating bath comprising: (a) a source, of copper ions; (b) a source of methane sulphonate ions; (c) a source of chloride ions; (d)an organosulphur compound having the formula R-S-R' -SO<SUB>3</SUB>"X<SUP>+</SUP> or X<SUP>+</SUP>-O<SUB>3</SUB>S-R'S-R-S-R' -SO<SUB>3</SUB>- X<SUP>+</SUP>, wherein R is alkyl, hydroxyalkyl or alkyl ether, R' is a C<SUB>2</SUB>-C<SUB>4</SUB> alkyl group, and X<SUP>+</SUP> is a cation; and (e) a polyether compound and method of using the same. The copper plating bath produces a plating deposit that has a stable hardness and is free from self-annealing during high speed plating. |