A IPA vaporizing apparatus for drying semiconductor wafer,申请号KR20010047719-传众专利搜索

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发明名称	A IPA vaporizing apparatus for drying semiconductor wafer
摘要
申请公布号	KR100785454(B1)	申请公布日期	2007.12.13
申请号	KR20010047719	申请日期	2001.08.08
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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