发明名称 |
GALLIUM NITRIDE SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A nitride semiconductor and a method for manufacturing the same are provided to control a lattice structure by forming an intermediate layer. An intermediate layer forming process is performed to form an intermediate layer on a substrate(100-1) in order to be matched with a nitride epitaxial layer in a lattice matching manner. A nitride forming process is performed to form a nitride on the intermediate layer. The nitride is used for forming the nitride epitaxial layer. The process for forming the intermediate layer includes a process for depositing a rare-earth element oxide on the substrate, and a process for forming a rare-earth element silicate layer(200-1b) by performing a thermal process in a temperature range of 500 to 2000 degrees centigrade.
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申请公布号 |
KR100779847(B1) |
申请公布日期 |
2007.11.28 |
申请号 |
KR20060046466 |
申请日期 |
2006.05.24 |
申请人 |
KOREA UNIVERSITY INDUSTRIAL & ACADEMIC COLLABORATION FOUNDATION |
发明人 |
KIM, TAE GEUN;SHIN, YOUNG CHEOL;CHOI, WON CHEOL |
分类号 |
H01L33/12 |
主分类号 |
H01L33/12 |
代理机构 |
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