| 摘要 |
An electrode assembly and a plasma processing apparatus using the same are provided to make uniform plasma density by achieving a high level of in-surface uniformity in plasma processing. An electrode assembly generates a plasma by forming a high-frequency electric field in a processing chamber, in which a substrate to be processed is accommodated. A plate shaped member is made of a metal matrix composite material, and has an electric resistance distribution such that an electric resistance in a central portion of the plate shaped member is greater than that in a peripheral portion thereof. The plate shaped member is an electrode surface member(32) that forms an exposed surface in the processing chamber.
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