| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target capable of film-forming a metal compound film excellent in both of a crystallization facilitating function and optical characteristics in regard to the sputtering target used in film-forming, etc. of an interlayer film of a phase change optical recording medium. <P>SOLUTION: The sputtering target has a composition expressed as M(O<SB>1-x</SB>N<SB>x</SB>)<SB>z</SB>in which M is at least one kind of element selected from Ti, Zr and Hf, and x and z respectively satisfy 0<x≤0.7 and 0.5≤z≤2.0 (atomic ratio), or as (M<SB>1-a</SB>Cr<SB>a</SB>)(O<SB>1-x</SB>N<SB>x</SB>)<SB>z</SB>in which M is at least one kind of element selected from Ti, Zr and Hf, and a, x and z respectively satisfy 0.1≤a≤0.5, 0<x≤0.7 and 0.5≤z≤2.0 (atomic ratio). A metal oxide/nitride film formed by using such a sputtering target is used for interlayers 4, 6, etc. of the phase change optical recording medium 1. <P>COPYRIGHT: (C)2007,JPO&INPIT |
