发明名称 |
THIN-FILM PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, ELECTROOPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To reduce contact resistance between upper and lower layers while ensuring adhesiveness of a conductive film pattern in forming a thin-film pattern of a multilayer wiring on a substrate by using a liquid drop jetting method. SOLUTION: The method of forming a thin-film pattern having a multilayer wiring has steps of: forming an insulating film on a base including a substrate and having a first pattern region having a conductivity on the substrate; forming a contact hole on the insulating film; and forming a bank for forming a second pattern region having a first wide portion and a second wide portion on a region including the contact hole, on the insulating film. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007243114(A) |
申请公布日期 |
2007.09.20 |
申请号 |
JP20060067422 |
申请日期 |
2006.03.13 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SHIOTANI ETSUKO;YAMADA KEISUKE |
分类号 |
H01L21/3205;G02F1/1345;G02F1/1368;H01L21/288;H01L21/768;H01L29/786 |
主分类号 |
H01L21/3205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|