发明名称 THIN-FILM PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, ELECTROOPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To reduce contact resistance between upper and lower layers while ensuring adhesiveness of a conductive film pattern in forming a thin-film pattern of a multilayer wiring on a substrate by using a liquid drop jetting method. SOLUTION: The method of forming a thin-film pattern having a multilayer wiring has steps of: forming an insulating film on a base including a substrate and having a first pattern region having a conductivity on the substrate; forming a contact hole on the insulating film; and forming a bank for forming a second pattern region having a first wide portion and a second wide portion on a region including the contact hole, on the insulating film. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007243114(A) 申请公布日期 2007.09.20
申请号 JP20060067422 申请日期 2006.03.13
申请人 SEIKO EPSON CORP 发明人 SHIOTANI ETSUKO;YAMADA KEISUKE
分类号 H01L21/3205;G02F1/1345;G02F1/1368;H01L21/288;H01L21/768;H01L29/786 主分类号 H01L21/3205
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