| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having high barrier properties, transparency and small film stress and being excellent in stability of the barrier properties with time. SOLUTION: The gas barrier film has a transparent flexible substrate 2 and at least one layer of gas barrier layer 3a comprising a thin film A of silicon oxide nitride with a steam permeability of≤0.09 g/m<SP>2</SP>/day, and is composed so that the elementary composition of the thin film A is N/Si (factor Xa) of 0.1-0.9, O/Si (factor Ya) of 0.65-1.85, and 4-(3Xa+2Ya)≤1. COPYRIGHT: (C)2007,JPO&INPIT
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