摘要 |
<p>The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched "on" or "off", wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.</p> |
申请人 |
MAPPER LITHOGRAPHY IP B.V.;KRUIT, PIETER;WIELAND, MARCO, JAN-JACO;STEENBRINK, STIJN, WILLEM, KAREL, HERMAN;JAGER, REMCO |
发明人 |
KRUIT, PIETER;WIELAND, MARCO, JAN-JACO;STEENBRINK, STIJN, WILLEM, KAREL, HERMAN;JAGER, REMCO |