COMPOSITION FOR RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM USING THE SAME
摘要
<p>Disclosed is a composition for a resist underlayer film, which can reduce the tailing of a pattern of a resist and can improve the shape of the pattern. Also disclosed is a resist underlayer film produced using the composition. The composition is characterized by containing (A) a siloxane compound having a mass average molecular weight of 3000 or smaller and (B) a siloxane polymer.</p>
申请公布号
WO2007105538(A1)
申请公布日期
2007.09.20
申请号
WO2007JP54303
申请日期
2007.03.06
申请人
TOKYO OHKA KOGYO CO., LTD.;YONEMURA, KOJI;TANAKA, TAKESHI;TAKAGI, ISAMU;YAMASHITA, NAOKI;FUJII, YASUSHI
