| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a shield film of an electromagnetic wave having excellent shield characteristics and excellent economic efficiency and productivity by sputtering, and formed shield film. SOLUTION: An object is to form on a substrate 2 a shield film 1 of at least three layers composed of an adhesive film 3, a conductive film 4, and a protective film 5, by using a sputtering apparatus including a vacuum chamber, a plurality of targets, and an electric power circuit connected to the targets, and particularly the adhesive film 3 and the protective film 5 are formed of SuS. COPYRIGHT: (C)2007,JPO&INPIT
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