| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection apparatus and an inspection method capable of accurate inspection and to provide a method of manufacturing a pattern substrate. SOLUTION: The inspection apparatus in one mode of the present invention inspects samples provided with a transmission pattern which transmits illumination light; a light-shielding pattern which shields the illumination light; and a half-tone pattern, and includes a half-tone pattern information storage part 21 for storing pattern information based on patterns provided for the samples; a variable amplifier 33 for amplifying detection data from a detector 15 at an amplification factor according to the patterns on the basis of the half-tone pattern information stored in the half-tone pattern information storage part 21; a differential circuit 41 for detecting defects by comparing amplification data 37 amplified by the variable amplifier with comparison data 29; and comparators 45 and 46. COPYRIGHT: (C)2007,JPO&INPIT
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