| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection device and a defect inspection method capable of improving accuracy of defect inspection at the end of an inspection domain. SOLUTION: Light sources 1A, 1B emit each irradiation light LA1, LB1 so that each end of an irradiation domain (inspection domain) is overlapped each other. An imaging device 2 receives each regularly reflected light LA2, LB2 and generates two images corresponding to each light source 1A, 1B. A main control part 3 synthesizes the two images and determines existence of a defect. By irradiating an inspection surface A with each irradiation light LA1, LB1 from mutually different directions, each position on the domain showing a defect in each image is deviated slightly. Consequently, even if each domain area showing the defect in each image is small, the domain area showing the detect part in the synthesized image becomes larger by overlapping the two images. Therefore, the accuracy of defect detection at the end of the inspection domain can be improved. COPYRIGHT: (C)2007,JPO&INPIT
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