发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTOSPACER, METHOD FOR PRODUCING PHOTOSPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY, LIQUID CRYSTAL DISPLAY ELEMENT, AND LIQUID CRYSTAL DISPLAY |
摘要 |
<p>Disclosed is a photosensitive resin composition for photospacers having high deformation recovery properties, which enables to eliminate display unevenness in a liquid crystal display having a cell thickness of 2-4 µm. Also disclosed are a method for producing a photospacer, a substrate for liquid crystal displays which enables a high image quality display by preventing display unevenness, a liquid crystal display element and a liquid crystal display. Specifically disclosed is a photosensitive resin composition for photospacers containing an alkali-soluble polymer material, a polymerizable monomer containing a urethane group and 5-15 acrylic groups, and a photopolymerization initiator. Also disclosed are a method for producing a photospacer by using such a photosensitive resin composition, a substrate for liquid crystal displays comprising such a photospacer, a liquid crystal display element and a liquid crystal display.</p> |
申请公布号 |
WO2007105381(A1) |
申请公布日期 |
2007.09.20 |
申请号 |
WO2007JP51459 |
申请日期 |
2007.01.30 |
申请人 |
FUJIFILM CORPORATION;TAKEMASA, KATSUYA |
发明人 |
TAKEMASA, KATSUYA |
分类号 |
G02F1/1339;C08F265/00;G03F7/004;G03F7/027 |
主分类号 |
G02F1/1339 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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