| 摘要 |
PROBLEM TO BE SOLVED: To provide a seasoning method of a film forming apparatus which reduces particles. SOLUTION: Plasma cleaning is performed for a film adhering on the inner wall of a processing container (step S1), and then, an amorphous silicon film is deposited (step S2). A silicon nitride film is deposited thereon in which a nitride content gradually increases in a thickness direction (step S3), and the inside of the processing container is kept with plasma of a rare gas until film-forming on a substrate starts (step S4). COPYRIGHT: (C)2007,JPO&INPIT
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