发明名称 |
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus capable of efficiently and certainly removing an organic matter adhering to a substrate without using a chemical. SOLUTION: The substrate cleaning apparatus is comprised of a transfer means 1 for transferring a substrate, an ejection nozzle 1 for ejecting heated steam onto the surface of the substrate being transferred to which an organic matter adheres, and a shower device 6 for applying a physical force onto the organic matter adhering to the substrate being transferred. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007237119(A) |
申请公布日期 |
2007.09.20 |
申请号 |
JP20060066257 |
申请日期 |
2006.03.10 |
申请人 |
SHIBAURA MECHATRONICS CORP;TOSHIBA CORP |
发明人 |
HAYASHI TOSHIHIDE;MAKINO TSUTOMU;WAKATSUKI TAKAHIKO;HAYAMIZU NAOYA;FUJITA HIROSHI;SAITO AKIKO |
分类号 |
B08B3/02;B08B1/04;B08B3/10;G02F1/13 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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