发明名称 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus capable of efficiently and certainly removing an organic matter adhering to a substrate without using a chemical. SOLUTION: The substrate cleaning apparatus is comprised of a transfer means 1 for transferring a substrate, an ejection nozzle 1 for ejecting heated steam onto the surface of the substrate being transferred to which an organic matter adheres, and a shower device 6 for applying a physical force onto the organic matter adhering to the substrate being transferred. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007237119(A) 申请公布日期 2007.09.20
申请号 JP20060066257 申请日期 2006.03.10
申请人 SHIBAURA MECHATRONICS CORP;TOSHIBA CORP 发明人 HAYASHI TOSHIHIDE;MAKINO TSUTOMU;WAKATSUKI TAKAHIKO;HAYAMIZU NAOYA;FUJITA HIROSHI;SAITO AKIKO
分类号 B08B3/02;B08B1/04;B08B3/10;G02F1/13 主分类号 B08B3/02
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