发明名称 SET OF EXTREMELY NARROW-BAND TWO-CHAMBER GAS-DISCHARGE LASERS CHARACTERIZED IN HIGH PULSE REPETITION FREQUENCY
摘要 FIELD: electric-discharge lasers including narrow-band gas-discharge ones characterized in high pulse repetition frequency. ^ SUBSTANCE: each of proposed lasers designed for producing pulses at repetition frequency of 4000 Hz or higher at pulse energy about 5 to 10 mJ or higher affording radiation power output of 20 to 40 W or higher has two separate discharge chambers of which one is part of master oscillator generating narrow-band prime beam which is amplified in second discharge chamber. Working chambers can be controlled separately. Each working chamber has one tangential-flow fan producing gas flow sufficient for operation at pulse repetition frequency of 4000 Hz. Master oscillator is provided with radiation-line narrowing module incorporating fast-response adjusting mirror. ^ EFFECT: enhanced quality of laser pulse radiation beams and power output. ^ 78 cl, 80 dwg
申请公布号 RU2306649(C2) 申请公布日期 2007.09.20
申请号 RU20040109147 申请日期 2002.08.28
申请人 SAJMER, INK. 发明人 NOULES DEHVID S.;BRAUN DEHNIEL DZH. V.;BEZOSEL' EHRVE A.;MAJERS DEHVID V.;ERSHOV ALEKSANDR I.;PARTLO VILL'JAM N.;SEHNDSTROM RICHARD L.;DAS PALASH P.;ANDERSON STJUART L.;FOMENKOV IGOR' V.;UZHAZDOVSKI RICHARD K.;ONKEL'S EHKKEKHARD D.;NESS RICHARD M.;SMIT SKOTT T.;KHALBERD VILL'JAM DZH.;OIKLES DZHEFFRI
分类号 H01S1/00;H01S3/02;G01J1/42;G01J9/00;G03F7/20;H01S3/00;H01S3/03;H01S3/036;H01S3/038;H01S3/04;H01S3/041;H01S3/08;H01S3/09;H01S3/0943;H01S3/097;H01S3/0971;H01S3/0975;H01S3/102;H01S3/104;H01S3/105;H01S3/1055;H01S3/11;H01S3/13;H01S3/131;H01S3/134;H01S3/137;H01S3/139;H01S3/22;H01S3/223;H01S3/225;H01S3/23 主分类号 H01S1/00
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