| 摘要 |
<p>A substrate cleaning method and apparatus and a programmable recording medium are provided to improve the particle removing efficiency of a substrate by uniformly removing particles from the substrate. A substrate(W) is immersed in a cleaning liquid stored in a cleaning tank(12). The substrate is cleaned by generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. In the step of cleaning the substrate, a dissolved gas concentration of a gas dissolved by the cleaning liquid inside the cleaning tank is changed. The generation of ultrasonic waves is stopped, and the dissolved gas concentration is changed during stop. When the dissolved gas concentration is changed, the dissolved gas concentration of the cleaning liquid is lowered.</p> |
