发明名称 |
Substrate cleaning method, substrate cleaning system and program storage medium |
摘要 |
<p>The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.</p> |
申请公布号 |
EP1834708(A2) |
申请公布日期 |
2007.09.19 |
申请号 |
EP20070005245 |
申请日期 |
2007.03.14 |
申请人 |
TOKYO ELECTRON LTD. |
发明人 |
WATANABE, TSUKASA;SHINDO, NAOKI;FURUKAWA, TAKAHIRO;KAMIKAWA, YUJI |
分类号 |
B08B3/12;B08B3/00;H01L21/00 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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