| 发明名称 |
COMPOSITION FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING RESIST PATTERN BY USING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming a resist protective film having basic performances required for a composition for forming a resist protective film as well as having improved coating performance of the composition and improved lithographic performance, and reducing cost by reducing the consumption of a chemical liquid. <P>SOLUTION: The composition for forming a resist protective film to be applied on a resist film contains a polymer soluble with water and/or alkali and a fluorine-containing polyether. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007219180(A) |
申请公布日期 |
2007.08.30 |
| 申请号 |
JP20060040020 |
申请日期 |
2006.02.16 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
ISHIZUKA KEITA;ANDO TOMOYUKI |
| 分类号 |
G03F7/11;G03F7/20;G03F7/38;H01L21/027 |
主分类号 |
G03F7/11 |
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