| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polymer and insulation film, having a high heat resistance and an extremely low specific permittivity useful in the production of a semiconductor, an amino group-containing adamantane derivative capable of forming them and a method for producing the same. <P>SOLUTION: This amino group-containing adamantane derivative is expressed by formula (1) [wherein, X<SP>1</SP>, etc., are each the same or different and show a single bond or a divalent aromatic or non-aromatic ring group; and R<SP>1</SP>, etc., which are each adamantane ring or a substituting group bonded with a ring X<SP>1</SP>, etc., are each the same or different, and show H, a hydrocarbon group, carboxyl or an acyl, which may be protected with a protecting group, or a group expressed by formulae (2A), (2B) or (2C) (wherein, ring Ys are each the same or different and show a single ring or a multiple ring aromatic or non-aromatic ring; and R<SP>5</SP>, R<SP>6</SP>are each the same or different and show hydroxy which may be protected with a protecting group and R<SP>7</SP>is an amino group which may be protected with a protecting group)]. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
