发明名称 EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an exposure device which employs an overfield optical system, and which keeps the distribution of the quantity of light on a scanning surface constant in accordance with a plurality of quantities of scanning light. SOLUTION: The light quantity of a light beam applied to a photo conductor is set by being selected from among a plurality of stages. One of a plurality of correction current profiles is selected on the basis of the set light quantity, and an electric current, which is corrected on the basis of the selected correction current profile, is supplied to a light source. The light quantity of the light beam, which is applied onto the photo conductor, is corrected by the corrected electric current, so that the light quantity of the light beam on the photo conductor can be kept almost constant over a scanning direction. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007216428(A) 申请公布日期 2007.08.30
申请号 JP20060037106 申请日期 2006.02.14
申请人 CANON INC 发明人 TOMIOKA YASUHIRO
分类号 B41J2/44;G02B26/10;G02B26/12;H04N1/113 主分类号 B41J2/44
代理机构 代理人
主权项
地址