发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor light emitting element on which an InGaN layer can be normally grown in a crystal. <P>SOLUTION: The method for manufacturing a semiconductor light emitting element includes a process in which a substrate 1 is mounted in a crystal growth chamber 2, and a raw material gas containing an NH<SB>3</SB>gas is supplied from a gas supplying means 3 to the crystal growth chamber 2. Then an InGaN layer is grown on the substrate 1 in a crystal. The concentration of H<SB>2</SB>O in the raw material gas is lower than 0.1 ppm using an FTIR4 which can measure the concentration of H<SB>2</SB>O in the NH<SB>3</SB>gas. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007221016(A) |
申请公布日期 |
2007.08.30 |
申请号 |
JP20060041834 |
申请日期 |
2006.02.20 |
申请人 |
ROHM CO LTD |
发明人 |
SONOBE MASAYUKI;OTA HIROAKI |
分类号 |
H01L21/205;H01L33/06;H01L33/32 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|