发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor light emitting element on which an InGaN layer can be normally grown in a crystal. <P>SOLUTION: The method for manufacturing a semiconductor light emitting element includes a process in which a substrate 1 is mounted in a crystal growth chamber 2, and a raw material gas containing an NH<SB>3</SB>gas is supplied from a gas supplying means 3 to the crystal growth chamber 2. Then an InGaN layer is grown on the substrate 1 in a crystal. The concentration of H<SB>2</SB>O in the raw material gas is lower than 0.1 ppm using an FTIR4 which can measure the concentration of H<SB>2</SB>O in the NH<SB>3</SB>gas. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007221016(A) 申请公布日期 2007.08.30
申请号 JP20060041834 申请日期 2006.02.20
申请人 ROHM CO LTD 发明人 SONOBE MASAYUKI;OTA HIROAKI
分类号 H01L21/205;H01L33/06;H01L33/32 主分类号 H01L21/205
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