| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to collectively carry out by the same etching solution a wet-etching of a metal film consisting of silver or a silver alloy making silver a principal component and a protective film, in a substrate with a laminated structure and a method of manufacturing the substrate with the laminated structure. SOLUTION: A substrate 10 with the laminated structure is constituted by forming at least a metal film 31 and a protective film 32 on a front surface of a substrate 20 in this order. The metal film 31 consists of silver or the silver alloy making silver the principal component, and a thickness of the protective film 32 is 8Åor more and 32Åor less, and the wet-etching of the metal film 31 and the protective film 32 can be collectively carried out by the same etching solution. COPYRIGHT: (C)2007,JPO&INPIT
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