发明名称 Micro-pattern forming apparatus, micro-pattern structure, and method of manufacturing the same
摘要 There is provided a micro-pattern forming apparatus including an electrospraying part for applying a voltage to a solution containing a sample to electrostatically atomizing the solution; a supporting part ( 30 ) for supporting a chip ( 26 ), on which the sample in the solution electrostatically atomized by the electrospraying part, is to be deposited; and a fine mask part ( 24 ) disposed between the electrospraying part and the supporting part, having a mask pattern for being passed through by the electrostatically atomized solution in order to form a micro-pattern of the sample upon the chip, wherein the mask pattern is made from a photoresist material with concavity and convexity on the side of the supporting part.
申请公布号 US2007202258(A1) 申请公布日期 2007.08.30
申请号 US20060512355 申请日期 2006.08.30
申请人 RIKEN 发明人 YAMAGATA YUTAKA;OHMORI HITOSHI;KASE HIROSHI;NONAKA HIROMI;KANEKO AI;NITTA KAZUYA
分类号 B05D1/32;B81C99/00;B05C5/00;C25D5/00 主分类号 B05D1/32
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