发明名称 FABRICATION METHOD FOR AN INTERCONNECT ON A SUBSTRATE AND A CORRESPONDING INTERCONNECT
摘要 <p>Production of a conducting strip (4) on a passivated substrate (1) comprises: applying a mask to the substrate; structuring the mask to form an opening corresponding to the conducting strip; providing a conducting strip in the opening on the substrate; removing the mask; and encasing the conducting strip using a metal-selective wet chemical dip coating method. An Independent claim is also included for a corrosion-protected conductor strip produced by the above process. Preferred Features: A diffusion barrier and/or short circuit layer is applied to the substrate before applying the mask. The diffusion barrier and/or short circuit layer is made from a metal layer, preferably titanium. A support layer (3) is applied on the substrate before the mask is applied.</p>
申请公布号 KR100753006(B1) 申请公布日期 2007.08.30
申请号 KR20020075591 申请日期 2002.11.30
申请人 发明人
分类号 H05K3/40;H01L21/288;H01L21/60 主分类号 H05K3/40
代理机构 代理人
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