发明名称 |
Halbleiteraufbau mit vergrabenem Inselgebiet und Konaktgebiet |
摘要 |
Semiconductor device has a semiconductor region (2) of one conductivity provided with a buried island region (3) of the opposite conductivity, having a contact region (5) of the first conductivity type at the surface (80 ) of the island region which is separated from the surface (20) of the semiconductor region via a lateral channel region (22), forming part of the current path to or from the contact region. The current (I) is controlled within this current path via at least one depletion zone (23,24) having a lateral edge extending as far as the contact region. |
申请公布号 |
DE10036208(B4) |
申请公布日期 |
2007.04.19 |
申请号 |
DE2000136208 |
申请日期 |
2000.07.25 |
申请人 |
SICED ELECTRONICS DEVELOPMENT GMBH & CO. KG |
发明人 |
FRIEDRICHS, PETER;MITLEHNER, HEINZ;SCHOERNER, REINHOLD |
分类号 |
H01L29/80;H01L21/337;H01L29/12;H01L29/24;H01L29/78;H01L29/808;H01L29/812;H01L29/861 |
主分类号 |
H01L29/80 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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