发明名称 |
INTEGRATED ETCHED MULTILAYER GRATING BASED WAVELENGTH DEMULTIPLEXER |
摘要 |
An integrated etched multilayer grating-based wavelength multiplexer / demultiplexer is disclosed wherein an etched multilayer grating structure is monolithically integrated within the optical waveguide stack of the multiplexer / demultiplexer to reflectively diffract an input optical beam. The multilayer grating structure is generall y comprised of a series of etched diffractive elements and an etched multilayer reflector, the combined optical response of which providing the desired multiplexing / demultiplexin g effect. The etched structures are generally comprised of shallow etch structures in a to p surface of the multiplexer / demultiplexer waveguide stack. Monolithically integrated input and output ridge waveguides may also be provided, optionally fabricated in a sam e etching step as the etched multilayer grating.
|
申请公布号 |
CA2564658(A1) |
申请公布日期 |
2007.04.19 |
申请号 |
CA20062564658 |
申请日期 |
2006.10.19 |
申请人 |
MCGILL UNIVERSITY |
发明人 |
BISAILLON, ERIC;KIRK, ANDREW G. |
分类号 |
G02B5/18;G02B26/08;H04J14/02 |
主分类号 |
G02B5/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|