发明名称 INTEGRATED ETCHED MULTILAYER GRATING BASED WAVELENGTH DEMULTIPLEXER
摘要 An integrated etched multilayer grating-based wavelength multiplexer / demultiplexer is disclosed wherein an etched multilayer grating structure is monolithically integrated within the optical waveguide stack of the multiplexer / demultiplexer to reflectively diffract an input optical beam. The multilayer grating structure is generall y comprised of a series of etched diffractive elements and an etched multilayer reflector, the combined optical response of which providing the desired multiplexing / demultiplexin g effect. The etched structures are generally comprised of shallow etch structures in a to p surface of the multiplexer / demultiplexer waveguide stack. Monolithically integrated input and output ridge waveguides may also be provided, optionally fabricated in a sam e etching step as the etched multilayer grating.
申请公布号 CA2564658(A1) 申请公布日期 2007.04.19
申请号 CA20062564658 申请日期 2006.10.19
申请人 MCGILL UNIVERSITY 发明人 BISAILLON, ERIC;KIRK, ANDREW G.
分类号 G02B5/18;G02B26/08;H04J14/02 主分类号 G02B5/18
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