| 摘要 |
A pattern observation apparatus includes: a defect position information input unit which downloads defect position information for a pattern, the defect position information having been detected by an external inspection apparatus with regard to a specimen in which the pattern is formed; a moving unit which moves the specimen so as to bring a place detected as defective by the inspection apparatus into a field of view on the basis of the defect position information; a charged particle source which generates a charged particle beam and applies the charged particle beam to the specimen; a signal processing unit which detects at least one of secondary charged particles, reflected charged particles and back scattering charged particles emitted from the specimen due to the application of the charged particle beam and which outputs data on an inspection image of a specimen surface in the defective place; an inspection unit which re-detects an abnormality of the place detected as defective, on the basis of the inspection image; and a view field adjusting unit which adjusts an image size or the number of pixels in accordance with accuracy distribution of the defect position information in the inspection apparatus while a resolution is kept fixed.
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