| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a good film pattern by supplying the functional fluid to a desired location in a desired condition. SOLUTION: When forming a film pattern by supplying the functional fluid to a substrate, this method consists of a process for applying a sensitive material to form a bank on the substrate, a process for exposing the sensitive material according to the film pattern, a process for forming the bank by developing the exposed sensitive material, a process for finishing the top surface of the bank formed by development to be liquid repellent, a process for supplying the functional liquid to an area partitioned by the bank, and a process for burning the bank. After finishing the top surface of the bank to be liquid repellent by development, functional liquid supply takes place prior to bank burning. COPYRIGHT: (C)2007,JPO&INPIT |
