发明名称 PATTERN FORMATION METHOD AND DROP DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method which increases the profile controlling properties of a pattern which consists of drops by enhancing the irradiation strength and irradiation position accuracy of laser light to irradiate the drops that is dropped on a substrate, and to provide a drop discharge apparatus therefor. SOLUTION: A laser head 36 is installed in a direction of an X arrow of a discharge head 30 so that the laser light B from the laser head 36 is emitted to the substrate reflection position PR with the critical angle (angle of incidenceθ1) to the surface 2a to totally reflect to the discharge head 30 side. A reflection face 31a to reflect the laser light B to the substrate 2 side of a nozzle plate 31 is installed so that the laser light B from the substrate reflection position PR is reflected to introduce to the irradiation position PT on the surface 2a with the irradiation angleθ2 (angle of incidence: critical angle). COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007098283(A) 申请公布日期 2007.04.19
申请号 JP20050291559 申请日期 2005.10.04
申请人 SEIKO EPSON CORP 发明人 MIURA HIROTSUNA
分类号 B05D3/06;B05C5/00;B05C9/12;B05D1/26;G02F1/13 主分类号 B05D3/06
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