| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate with a high-quality patterned metal film by which the generation of pitting can be prevented during wet-etching of the metal film formed on a substrate. SOLUTION: The method of manufacturing a substrate with a patterned metal film includes a step (a) to apply a photosensitive resin composition to a metal film formed on a substrate and form a photosensitive layer, a step (b) to expose the photosensitive layer for patterning and develop it so as to form a resist pattern, and a step (c) to wet-etch the metal film by using he resist pattern as a mask as well as an acid solution containing an ionophore compound. COPYRIGHT: (C)2007,JPO&INPIT
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