发明名称 Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same
摘要 In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.
申请公布号 US2007087580(A1) 申请公布日期 2007.04.19
申请号 US20060540604 申请日期 2006.10.02
申请人 KANG DONG-MIN;BAEK KUI-JONG;HAHN WOONG;LEE CHUN-DEUK;LIM JUNG-HUN;KIM YOUNG-NAM;KIM HYUN-JOON 发明人 KANG DONG-MIN;BAEK KUI-JONG;HAHN WOONG;LEE CHUN-DEUK;LIM JUNG-HUN;KIM YOUNG-NAM;KIM HYUN-JOON
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
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