发明名称 |
Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same |
摘要 |
In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.
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申请公布号 |
US2007087580(A1) |
申请公布日期 |
2007.04.19 |
申请号 |
US20060540604 |
申请日期 |
2006.10.02 |
申请人 |
KANG DONG-MIN;BAEK KUI-JONG;HAHN WOONG;LEE CHUN-DEUK;LIM JUNG-HUN;KIM YOUNG-NAM;KIM HYUN-JOON |
发明人 |
KANG DONG-MIN;BAEK KUI-JONG;HAHN WOONG;LEE CHUN-DEUK;LIM JUNG-HUN;KIM YOUNG-NAM;KIM HYUN-JOON |
分类号 |
H01L21/31;H01L21/469 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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地址 |
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