| 发明名称 |
IRRADIATION UNIT, METHOD OF IRRADIATION AND SEMICONDUCTOR DEVICE |
| 摘要 |
<p>[PROBLEMS] To provide a semiconductor production apparatus capable of modifying an insulating film. [MEANS FOR SOLVING PROBLEMS] Irradiation unit is provided with not only first irradiation means for irradiating an insulating film with a light of first wavelength but also second irradiation means for irradiating the insulating film with a light of second wavelength.</p> |
| 申请公布号 |
WO2007043205(A1) |
申请公布日期 |
2007.04.19 |
| 申请号 |
WO2006JP308543 |
申请日期 |
2006.04.24 |
| 申请人 |
YATABE, MASSAO;OKUMURA, MASARU;SHIOYA, YOSHIMI |
发明人 |
SHIOYA, YOSHIMI |
| 分类号 |
H01L21/31;H01L21/316 |
主分类号 |
H01L21/31 |
| 代理机构 |
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