| 摘要 |
<p>A prescribed statistics value, for instance, dispersion, is calculated for a plurality of demarcated regions on a wafer exposed for generating a pattern image for measurement, and based on the calculated statistics value of each region, optical characteristics of a projection optical system are obtained (steps (504, 506, 512, 514). The prescribed statistics value includes a deviation from a prescribed reference value of a luminance value of each pixel included in imaging data obtained from imaging. Thus, measurement with excellent repeatability can be performed, even by means of a microscope having a resolution lower than that of a SEM, for instance, a measuring apparatus such as an imaging alignment sensor for an exposure apparatus,</p> |
