发明名称 PHOTONIC CRYSTAL AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photonic crystal having high reflectance to visible rays with a structure in which absorption of visible rays by Si is suppressed and Si films and SiO<SB>2</SB>films are alternately laminated. SOLUTION: In the photonic crystal 1 having a laminated structure in which a plurality of pairs of an Si film 3 and an SiO<SB>2</SB>film 2 are cyclicly laminated, the Si film 3 has the extinction coefficient in visible rays range of which the wavelength is from 480 to 800 nm is smaller than the extinction coefficient of a bulk Si single crystal. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007101695(A) 申请公布日期 2007.04.19
申请号 JP20050288846 申请日期 2005.09.30
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 ABE TAKAO
分类号 G02B1/02;G02B5/26;G02B6/12;G02B6/13 主分类号 G02B1/02
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