发明名称 |
PHOTONIC CRYSTAL AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a photonic crystal having high reflectance to visible rays with a structure in which absorption of visible rays by Si is suppressed and Si films and SiO<SB>2</SB>films are alternately laminated. SOLUTION: In the photonic crystal 1 having a laminated structure in which a plurality of pairs of an Si film 3 and an SiO<SB>2</SB>film 2 are cyclicly laminated, the Si film 3 has the extinction coefficient in visible rays range of which the wavelength is from 480 to 800 nm is smaller than the extinction coefficient of a bulk Si single crystal. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007101695(A) |
申请公布日期 |
2007.04.19 |
申请号 |
JP20050288846 |
申请日期 |
2005.09.30 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
ABE TAKAO |
分类号 |
G02B1/02;G02B5/26;G02B6/12;G02B6/13 |
主分类号 |
G02B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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