| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for processing a substrate by which the substrate is processed with a process liquid, and a cup body and a processing tank are cleaned with a cleaning liquid with a simple configuration. SOLUTION: The device includes the processing tank 1, the cup body 2 which is provided in the processing tank and internally has a rotary table 16 rotary-driven while holding the substrate; a first arm body 56 provided at the tip thereof with a processing nozzle 58 for injecting the process liquid for processing the substrate held by the rotary table; a second arm body 57 provided at the tip thereof with a washing nozzle 59 for injecting the cleaning liquid for cleaning the processing tank and the cup body, a movable body 51 which is provided to the processing tank and to which ends of the first arm body and the second arm body are fixed; and a rotary drive source 52 which switches a process state wherein the movable body is driven to position the processing nozzle provided to the first arm body to the upper part of the cup body to process the substrate with the process liquid, and a cleaning state wherein the cleaning nozzle provided to the second arm body is positioned to the upper part of the cup body to clean the cup body and the processing tank with the cleaning liquid. COPYRIGHT: (C)2007,JPO&INPIT
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