| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor for forming a carbon film wherein a deposition of an adhesive substance to an exhaust system is minimized without sacrificing a throughput, and wet cleaning is scarcely needed at a high availability factor. SOLUTION: In the plasma processor 100, a reaction chamber 101 is interconnected to an exhaust pump 124 by an exhaust line 132, also, the exhaust line is provided with a main exhaust valve 122 and a pressure control valve 123 in an order from an upstream side, and gas containing hydrocarbon is ionized in the reaction chamber 101 to form a film containing carbon on a filmed body. A reaction chamber 119 is provided between the reaction chamber 101 and the main exhaust valve 122, exhaust gas from the reaction chamber 101 is ionized in the reaction chamber, and this arrangement is formed to cause oxidative radical. COPYRIGHT: (C)2007,JPO&INPIT
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