METHOD OF MANUFACTURING A INFORMATION PROCESSING APPARATUS

摘要

A manufacturing method of an information processing device is provided to form a polarized layer having extremely small RMS and P-V values through a chemical mechanical polishing process under low-temperature and low-speed polishing conditions, thereby remarkably reducing wear of a probe. An electrode(105) is formed on an object(100). A preliminary polarized layer is formed on the electrode(105). A surface of the preliminary polarized layer is polished through a chemical mechanical process to form a polarized layer(115) on the electrode(105). A reaction preventive layer(120) is formed on the polarized layer(115). A semiconductor layer(125) is formed on the preventive layer(120). A probe is disposed on the semiconductor layer(125).