DEVICE FOR MEASURING QUANTITY OF ETCHING, ETCHING DEVICE AND METHOD FOR MEASURING QUANTITY OF ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a device for measuring the quantity of etching capable of stably measuring the etching quantity of a substance to be treated for a long term, an etching device, and a method for measuring the quantity of the etching. SOLUTION: The device 50 for measuring the quantity of the etching measures the quantity of the etching of a substrate 22 when the substrate 22 is etched by using ion beams 26. The device for measuring the quantity of the etching has a chamber 58 forming an introducing port 58a for introducing a part 26a of ion beams 26 and a member to be treated 60 housed in the chamber 58 and etched by a part 26a of ion beams 26. The device 50 further has a mass detecting element 70 receiving a substance 64 generated from the member to be treated 60 while detecting the mass of the received substance 64. COPYRIGHT: (C)2007,JPO&INPIT